EUV beamline cross calibration
Wavelength Final Calibration
Si edge calibrated with Au O1 edge photo spectroscopy in SINS beamline
Wavelength repeatability
Plot displays the inflexion point wavelength of the S-like fitting curves
Scan across Si L2 edge (x11)
Scan Parameters:
λ scan from 12.2-12.6 nm
Step 0.005 nm, Si filter
V. Slits 100 μm
S-like curves fitted to data
Wavelength Repeatability: 0.0006 nm
Centroid repeatability
Same plot measured 10 times without change in stages position
Scan |
Centroid (nm) |
Advanced light source (ALS) (reference) | 13.394 |
#1 | 13.3903 |
#2 | 13.3908 |
#3 | 13.3907 |
#4 | 13.3903 |
#5 | 13.3905 |
#6 | 13.3907 |
#7 | 13.3907 |
#8 | 13.3906 |
#9 | 13.3904 |
#10 | 13.3906 |
Sample DQE630007 same spot (x10)
Scan Parameters:
λ scan from 12.8-14 nm
Step 0.02 nm, Si filter
V. Slits 150 μm
Centroid Repeatability: 0.0002 nm
Reflectance @ centroid Repeatability
Stages position changed after each scan; direct and reflected beam were measured
Scan | Centroid (nm) | R @ centroid |
Advanced light source (ALS) (reference) | 13.394 | 0.6094 |
#1 | 13.396 | 0.6038 |
#2 | 13.3961 | 0.6034 |
#3 | 13.3966 | 0.6057 |
Change in stages: |
Direct Beam Configuration | Reflected Beam Configuration |
Detector θ | 0 deg | Detector θ | 168 deg |
Mask θ | 0 deg | Mask θ | 84 deg |
Mask Z | -12 mm | Mask Z | 0 mm |
Mask Y | 5 mm | Mask Y | 0 mm |
Mask X | 5 mm | Mask X | 0 mm |
Sample DQE630007 (x3)
Scan Parameters:
λ scan from 12.8-14 nm
Step 0.02 nm, Si filter
V. Slits 150 μm
Centroid Repeatability: 0.0003 nm
Reflectance @ centroid Repeatability: 0.0010
Loading/unloading exercise
Mask was unloaded from reflectometer and loaded 2 times
Scan |
Centroid (nm) |
Advanced light source (ALS) (reference) | 13.3940 |
After 1st load | 13.3906 |
After 2nd load | 13.3903 |
(Reflectance scans) | 13.3962 |
Sample DQE630007, same spot (x3)
Scan Parameters:
λ scan from 12.8-14 nm
Step 0.02 nm, Si filter
V. Slits 150 μm